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Scienta Omicron - In this paper, Tapei Nishihara et al. evaluated the silicon nitride (SiN) films fabricated by plasma enhanced atomic layer deposition (PEALD) on the trench Si substrate, focusing mainly on
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Influence of Silicon Binding Energy on Photoluminescence of Si-implanted Silicon Dioxide A. A. González-Fernández , J. Juvert
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